Products
Semiconductor Photoresist Ultrasonic Lithography Coating System
Item No: FS620
Frequency: 20-200khz for Optional
Power: 10-100w
Spray Uniformity: ≥95%
Solution Conversion Rate: ≥95%
Solution viscosity: ≤30cps
Atomized particles (median value): 10-45μm(Distilled water),
determined by nozzle frequency
Hangzhou Shengtu Technology Co., Ltd. is one of the leading manufacturers and suppliers of semiconductor photoresist ultrasonic lithography coating system in China. Welcome to buy high quality customized products at low price from our factory. Contact us for more details.
Description:
Ultrasonic spraying serves as a straightforward, cost-effective and highly repeatable method for photoresist coating during wafer lithography processes. FUNSONIC's ultrasonic lithography coating system for semiconductor photoresist adopts sophisticated layered deposition technology to achieve precise regulation over fluid flow rate, coating travelling speed and material deposition volume.
By adopting low-velocity spray forming, the equipment can shape atomized droplets into precisely controllable spray patterns. This effectively eliminates overspray issues and delivers ultra-thin, highly homogeneous coating films.
FUNSONIC's system excels in forming exceptionally uniform deposited layers, particularly on the upper sections of sidewalls for high-aspect-ratio trenches and V-groove structures. In contrast, traditional spin-coating (centrifugal spinning) fails to achieve conformal sidewall coverage, and inevitably causes excessive photoresist accumulation at trench bottom cavities.
Advantages :
1. Delivers consistent film coverage on diverse complex surface profiles.
2. Achieves superior coating uniformity on high-aspect-ratio grooves.
3. Features clog-free atomization spray performance.
4. Enables precise deposition of ultra-uniform single-micron thin films.
5. Adopts a mature, highly repeatable spraying process.



Application:






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Product Type |
Intelligent Ultrasonic Precision Coating Machine desktop Type FS620 |
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Spray Nozzle Operating Frequency |
110KHz or Customized |
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Nozzle Power |
1-15W |
|
Continuous Spraying Volume Max |
0.5-12ml/min |
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Effective Spraying Width |
50-100mm |
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Spray Uniformity |
≥95% |
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Solution Conversion Rate |
≥95% |
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Dry Film Thickness |
20nm-100μm |
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Solution Viscosity |
≤20cps |
|
Temperature Range |
1-60℃ |
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Atomized Particles (Median Value) |
15-28μm (distilled water), determined by the frequency of the nozzle |
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Diversion Pressure Max |
≤0.15MPA |
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Input Voltage |
220V±10%/50-60Hz |
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Exercise Mode |
XYZ three-axis, independently programmable |
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Control Mode |
FUNSONIC spraying control system, PLC control, 13.3-inch full-color touch screen |
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Control Content |
Ultrasonic spraying, liquid supply, heating, ultrasonic dispersion and other systems |
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Liquid Supply Method |
Precision injection pump |
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Ultrasonic Dispersion System (Optional) |
20ml or 50ml, 40K, biological grade sampler |
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Rated Power of Ultrasonic Dispersion System |
100W |
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