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Typical Application Semiconductor Wafer Photoresist Coating Ultrasonic Nozzles

Typical Application Semiconductor Wafer Photoresist Coating Ultrasonic Nozzles

Item No: FSW-3002-L
Frequency: 30khz or Customized
Power: 1-15w
Continuous spraying amount(max): 0.5-20ml/min
Effective spraying width: 40-80mm
Spray uniformity: ≥95%
Solution viscosity: ≤30cps
Atomized particles (median value): 10-45μm

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Hangzhou Shengtu Technology Co., Ltd. is one of the leading manufacturers and suppliers of typical application semiconductor wafer photoresist coating ultrasonic nozzles in China. Welcome to buy high quality customized products at low price from our factory. Contact us for more details.

Description:

Ultrasonic scattering atomization nozzle is a nozzle device that uses ultrasonic technology to convert liquid into fine particulate atomized substances. It usually consists of an ultrasonic generator, vibrator, and nozzle.
Ultrasonic scattering atomization nozzles are widely used in many fields, such as spray cooling, coating, spray drying, drug atomization, aerosol generation, etc. It has the advantages of efficient conversion, adjustable atomization particle size, and easy operation, providing a reliable technical means for liquid atomization treatment.

Principle:

1. The ultrasonic generator generates high-frequency electrical indicators and transmits them to the vibrator. The vibrator converts electrical alerts into high-frequency mechanical vibrations.
2. High frequency vibration is transmitted to the liquid thru the nozzle, inflicting speedy mechanical vibration on the surface of the liquid.
3. Mechanical vibrations on the surface of liquids cause interactions between liquid molecules, resulting in changes in shear force and surface tension.
4. Changes in shear force and surface tension cause liquid molecules to peel off the surface of the liquid, forming small droplets.
5. Small droplets are then carried away from the nozzle by airflow or other external forces, forming a fine particulate atomized substance

Parameters:

FSW-3002-L

Features :

1. Adjustable atomization particle size: By adjusting parameters such as ultrasonic frequency, amplitude, and liquid properties, the atomization particle measurement generated by means of the atomization nozzle can be controlled, ranging from a few micrometers to tens of micrometers.

2. Efficient conversion: Ultrasonic scattering atomization nozzles have excessive electricity conversion efficiency, which can convert most of the enter electrical power into mechanical vibration energy, thereby enhancing the working effectivity of the nozzle.

3. No want to add compressed air: Compared to normal compressed air atomization nozzles, ultrasonic scattering atomization nozzles do now not require extra compressed air supply, lowering electricityconsumption and operational complexity.

4. Suitable for quite a number liquids: The ultrasonic scattering atomization nozzle is appropriate for a variety of liquids, such as water, solution, suspension, etc., and has proper adaptability and huge software fields.

Ultrasonic Spray Coated Machine 3